Scaling Alternating-Bias-Assisted Annealing for precision transmon frequency targeting on superconducting quantum processors

Here, we characterize ABAA tuning performance within a 150-mm wafer process flow and extend this technique to simultaneous, multi-channel tuning, demonstrating that a wafer-scale JJ resistance tuning precision of σ=0.50±0.05% alongside a component-level yield of ≥98.8% can be achieved. These results confirm the efficacy and scalability of ABAA for high-precision Hamiltonian targeting, a critical enabler for modular superconducting quantum processor technology.